Chemical etching composition for the preparation of 3-D...

Details Chemical etching composition for the preparation of 3-D... Chemical etching composition for the preparation of 3-D...

2011-05-10

2011-05-10

Culbert, Roberts (Department: 1716)

Etching a substrate: processes

Nongaseous phase etching of substrate

Etching inorganic substrate

C216S087000

Reexamination Certificate

active

07938980

ABSTRACT:
A method of using a chemical compound as an etchant for the removal of unmodified areas of a chalcogenide-based glass, while leaving the imagewise modified areas un-removed, wherein the compound contains a secondary amine, R1 R2 NH, with R1 and/or R2 having a sterically bulky group with more than 5 atoms.

REFERENCES:
patent: 4405710 (1983-09-01), Balasubramanyam et al.
Zaharescu et al: “Effects of Some Secondary Amines on the Oxidation . . . ” Barking GB, vol. 68, No. 1, Apr. 1, 2000, pp. 83-86, XP004294916.
Feigel et al: “Chalcogenide Glass-Based 1-12 Three-Dimensional . . . ” Melville, NY, US, vol. 77, No. 20, Nov. 13, 2000, pp. 3221-3223.
Lodeiro et al: “Intramolecular Excimer Formation and Sensing Behavior . . . ” Sensors and Actuators, ISSN: 0925-4005, Oct. 28, 2005, XP002435735.

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