Drying and gas or vapor contact with solids – Process – With contacting of material treated with solid or liquid agent
Patent
1998-03-03
1999-11-02
Bennett, Henry
Drying and gas or vapor contact with solids
Process
With contacting of material treated with solid or liquid agent
34342, 34401, 134 21, F26B 300
Patent
active
059746890
ABSTRACT:
Method and apparatus for drying and/or cleaning a workpiece, such as an electronic part, semiconductor wafer, printed circuit board or the like. As the workpiece is withdrawn from a processing liquid, a selected drying liquid, such as hydrofluoroether (HFE) or an HFE azeotrope, that has a very small surface tension, is volatile, and has a density that is greater than the processing liquid density, is sprayed on, dribbled on or otherwise transferred to an exposed surface of the workpiece. The workpiece can be dried in 7-45 seconds, or less, in most situations and can be cleaned using the invention. Drying and/or cleaning can be performed in a single workpiece process, a single workpiece continuous process or a batch process.
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Elson Robert J.
Ferrell Gary W.
Schipper John F.
Bennett Henry
Gary W. Farrell
Gravini Steve
Schipper John
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