Chemical depletion process to substantially remove residual mono

Details Chemical depletion process to substantially remove residual mono Chemical depletion process to substantially remove residual mono

1997-01-30

1999-03-23

Smith, Edward J.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528486, 528487, 528491, C08F 616

Patent

active

058861408

ABSTRACT:
A process has been developed to substantially reduce the residual monomer resulting at the end of the emulsion polymerization reaction. The process consists in submitting the latex to a redox process after the polymerization reaction. The recommended environment consists of vinyl monomers and/or conjugated dienes homo or copolymer that has a residual monomer content not in excess of 100,000 ppm at the end of the reaction. After the chemical depletion, residual monomer contents of 50 to 1000 ppm are achieved in a process that lasts from 0.5 to 5 hours at most.

REFERENCES:
patent: 4205161 (1980-05-01), Wiest et al.
patent: 5087676 (1992-02-01), Heider et al
Hawley's Condensed Chemical Dictionary, 11th Ed., p. 1257 Van Nostrand Reold, New York, 1987.

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