Hazardous or toxic waste destruction or containment – Processes for making harmful chemical substances harmless,... – By reacting with chemical agents
Reexamination Certificate
2006-06-20
2006-06-20
Anthony, Joseph D. (Department: 1714)
Hazardous or toxic waste destruction or containment
Processes for making harmful chemical substances harmless,...
By reacting with chemical agents
C588S401000, C422S028000, C422S029000, C422S030000, C422S032000, C252S186260, C252S186420, C510S310000, C510S375000, C510S500000, C510S503000
Reexamination Certificate
active
07064241
ABSTRACT:
A microemulsion composition having a solid source of peroxycarboxylic acid and germinant is used for chemical and biological warfare decontamination. A process for decontaminating uses the microemulsion composition.
REFERENCES:
patent: 3687815 (1972-08-01), Scharpf, Jr.
patent: 3956159 (1976-05-01), Jones
patent: 5296239 (1994-03-01), Colery et al.
patent: 5462692 (1995-10-01), Roesler et al.
patent: 5516486 (1996-05-01), Wright et al.
patent: 5612300 (1997-03-01), von Blucher et al.
patent: 5759989 (1998-06-01), Scialla et al.
patent: 6086785 (2000-07-01), Roesler et al.
patent: 6369288 (2002-04-01), Brown
patent: 6599715 (2003-07-01), Vanderberg et al.
patent: 6656919 (2003-12-01), Baugh et al.
patent: 2003/0045767 (2003-03-01), Brown
patent: 2004/0033269 (2004-02-01), Hei et al.
Brown Jerry S.
Hodge Richard C.
McCabe Margaret A.
McGrady Karen A.
Schilling Amanda S.
Anthony Joseph D.
Boalick, ESQ Scott R.
Bussan, ESQ Matthew J.
The United States of America as represented by the Secretary of
Thielman, ESQ Gerhard W.
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