Chemical amplified resist material containing photosensitive com

Details Chemical amplified resist material containing photosensitive com Chemical amplified resist material containing photosensitive com

1991-01-28

1994-09-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430170, 430270, 430907, 430909, 430921, 430923, 430925, 522 28, 522 59, 522 65, 522 68, G03F 7021, G03C 152

Patent

active

053506600

ABSTRACT:
A resist material comprising (a) a polymer having a monomer unit having a special functional group, a monomer unit having a phenolic hydroxyl group, and if necessary a third monomer unit, (b) a photoacid generator, and (c) a solvent can provide a resist film excellent in heat resistance and adhesiveness to a substrate when exposed to light with 300 nm or less such as deep UV light, KrF excimer laser light, etc., and is suitable for forming ultrafine patterns.

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patent: 4603101 (1986-07-01), Crivello
patent: 4678737 (1987-07-01), Schneller
patent: 4828958 (1989-05-01), Hayase et al.
SPIE's 1989 Symposium, 1086-03, pp. 22-33.
SPIE's 1989 Symposium, 1086-40, pp. 357-362.
SPIE's 1989 Symposium, 1086-01, pp. 2-9.
Polymer Bulletin 20, (1988), pp. 427-434.
Polymer Mater., Sci. Eng. 61, (1989), pp. 412-416.
Polymer Eng. Sci. 23, (1983), pp. 1012-1018.
Tet. Let., 14, Apr., 1978 pp. 1255-1258.

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