Chemical amplification type resist composition

Details Chemical amplification type resist composition Chemical amplification type resist composition

2008-05-29

2009-08-18

Solola, Taofiq A (Department: 1625)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

C549S079000

Reexamination Certificate

active

07576223

ABSTRACT:
The present invention provides a sulfonium salt of the formula (Ia)a polymeric compound comprising a structural unit of the formula (Ib)and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

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Derwent-AccNo. 1966-136264, Derwent-Week: 199831, Hasegawa et al, Patent Family inclusive of JP08027102 A and US5691111 A, two pages printed out Feb. 5, 2006 from EAST, Derwent Database.

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