Chemical amplification type resist composition

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From sulfur-containing reactant

Reexamination Certificate

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Details

C430S285100, C430S281100, C430S270100, C430S921000, C430S922000, C430S914000

Reexamination Certificate

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11643662

ABSTRACT:
The present invention provides a sulfonium salt of the formula (Ia)a polymeric compound comprising a structural unit of the formula (Ib)and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

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patent: 5691111 (1997-11-01), Iwas et al.
patent: 2001/0014428 (2001-08-01), Uetani et al.
patent: 2003/0219647 (2003-11-01), Wariishi
patent: 2003/0224284 (2003-12-01), Tao
patent: 2005/0019689 (2005-01-01), Kodama
patent: 11-228534 (1999-08-01), None
patent: 11228534 (1999-08-01), None
Derwent-AccNo: 1966-136264, Derwent-Week: 199831, Hasegawa et al, Patent Family inclusive of JP08027102 A and US5691111 A, two pages printed out Feb. 5, 2006 from East, Derwent Database.

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