Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-10-28
1996-06-18
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430176, 430191, 4302701, 430914, 430920, G03F 7021
Patent
active
055276598
ABSTRACT:
There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent substituted or unsubstituted aminophenyl, 9-julodidyl, Y.dbd.CH-- (wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen, or a group: ##STR2## (wherein Z.sup.1 and Z.sup.2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
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Ito Yukiyoshi
Koseki Kenichi
Obara Mitsuharu
Shimizu Ikuo
Yamaoka Tsuguo
Bowers Jr. Charles L.
Kyowa Hakko Kogyo Co. Ltd.
Young Christopher G.
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