Chemical agent producing device and method thereof

Etching a substrate: processes – Nongaseous phase etching of substrate – Projecting etchant against a moving substrate or controlling...

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216 85, 216 93, 156345, 1566271, 1566421, 134 13, H01L 21306, H01L 21304

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056744102

ABSTRACT:
The purity of a liquid chemical agent is improved simultaneously with obtaining a homogeneous concentration of a specific chemical in the agent, thereby improving the quality of substrate processing steps. Pure water is supplied from a pure water supply (30) into a process tank (1) by opening an opening/closing valve (33) on a pure water supply system (7) and by closing an opening/closing valve (19) on a circulation system (5). After the process tank (1) is completely charged with pure water, the opening/closing valve (33) is closed while the opening/closing valve (19) is opened. This closes a pipe conduit (11) of the circulation system (5) and allows pure water in the process tank (1) to be circulated through the circulation system (5) by a pump (13). A first opening/closing valve (49) on a gas supply system (9) is subsequently opened to allow hydrogen chloride gas from a hydrogen chloride gas supply (40) to be fed into a mixing unit (17) of the circulation system (5). This results in mixing of the hydrogen chloride gas with pure water in the mixing unit (17) to make a liquid chemical agent.

REFERENCES:
patent: 3306792 (1967-02-01), Thurmel et al.
patent: 3526560 (1970-09-01), Thomas
patent: 3999564 (1976-12-01), Pesek
patent: 4190481 (1980-02-01), Goffredo
patent: 4388276 (1983-06-01), Konstatouros et al.
patent: 4576677 (1986-03-01), Faul et al.
patent: 4838979 (1989-06-01), Nishida et al.
patent: 4971654 (1990-11-01), Scknegg et al.
patent: 5082518 (1992-01-01), Molinaro
patent: 5191908 (1993-03-01), Hiroe et al.
patent: 5227010 (1993-07-01), Lufert et al.
patent: 5282923 (1994-02-01), Cannizzaro
patent: 5415191 (1995-05-01), Mashimo et al.
patent: 5470421 (1995-11-01), Nakada et al.

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