Earth boring – well treating – and oil field chemistry – Well treating – Contains organic component
Patent
1997-01-08
1998-06-30
McKane, Joseph
Earth boring, well treating, and oil field chemistry
Well treating
Contains organic component
507203, 507261, 507263, 507265, 507267, 507927, 507929, 507931, C09K 704
Patent
active
057733902
ABSTRACT:
A chemical additive for cleaning a well drilling system and equipment includes an alcohol, preferably a terpene, and either an ether amine or a base fluid or combination of the two. The additive can be mixed with an aqueous solution that may be a water, salt or brine solution.
REFERENCES:
patent: 3601194 (1971-08-01), Gallus
patent: 3668129 (1972-06-01), Willett
patent: 4005753 (1977-02-01), Scheffel et al.
patent: 4065260 (1977-12-01), Quinlan
patent: 4101425 (1978-07-01), Young et al.
patent: 4192753 (1980-03-01), Pye et al.
patent: 4453598 (1984-06-01), Singer et al.
patent: 4456537 (1984-06-01), Oliver, Jr. et al.
patent: 4474240 (1984-10-01), Oliver, Jr. et al.
patent: 4475594 (1984-10-01), Drake et al.
patent: 4515699 (1985-05-01), Oliver, Jr. et al.
patent: 4528102 (1985-07-01), Oliver, Jr. et al.
patent: 4588031 (1986-05-01), Oliver, Jr. et al.
patent: 4588445 (1986-05-01), Oliver, Jr. et al.
patent: 4592425 (1986-06-01), Oliver, Jr. et al.
patent: 4728444 (1988-03-01), Clapper et al.
patent: 4735732 (1988-04-01), Clapper et al.
patent: 4828724 (1989-05-01), Davidson
patent: 5104556 (1992-04-01), Al-Yazdi
patent: 5152907 (1992-10-01), Dulaney et al.
Salisbury Darrell P.
Sloan Robert L.
McKane Joseph
Well-Flow Technologies, Inc.
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