Charged particles exposure apparatus having an optically deforma

Details Charged particles exposure apparatus having an optically deforma Charged particles exposure apparatus having an optically deforma

1987-08-25

1989-04-18

Howell, Janice A.

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396R, 2504922, 250398, H01J 312

Patent

active

048230138

ABSTRACT:
In a beam shaper superpositions of a deformed first diaphragm and a deformed or non-deformed second diaphragm can be realized by means of a quadrupole system. As a result of this a great freedom for adapting the spot cross-section to the patterns to be formed is obtained, as a result of which the number of writing pulses per pattern and hence the writing time for, for example, a chip can be considerably reduced and in particular non-orthogonal and non-linear transistions in the patterns can be written with greater definition.

REFERENCES:
patent: 4075488 (1978-02-01), Okzyzmz et al.
patent: 4182958 (1980-01-01), Goto et al.
patent: 4514638 (1985-04-01), Lischke et al.
patent: 4560878 (1985-12-01), Knaver et al.

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