Charged particle sources

Details Charged particle sources Charged particle sources

1987-08-07

1989-02-14

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

048048518

ABSTRACT:
Charged particles from a line emitter are focussed as a line image on a means for selectively blocking part of the image to produce a flat beam of controllable length. The blocking means may be an apertured plate with means for rotating and/or translating the image relative to the aperture to produce the required beam length. After passage through the aperture the beam may be twisted and/or translated to its original or some other orientation and position. The beam may be of electrons or ions and may be used in the manufacture or testing of integrated circuits. An alternative form of blocking means is a row of controllable gate electrodes which can block selected parts of the line beam; this is of particular value in producing c.r.t. displays.

REFERENCES:
patent: 3621327 (1971-11-01), Hashmi
patent: 4051381 (1977-09-01), Trotel
patent: 4121130 (1978-10-01), Gange
patent: 4130761 (1978-12-01), Matsuda
patent: 4153843 (1979-05-01), Pease
patent: 4472636 (1984-09-01), Hahn
patent: 4577111 (1986-03-01), Saitou et al.
Pfeiffer, Hans C., "Recent Advances in Electron Beam Lithography for the High Volume Production of VLSI Devices," IEEE Trans. on Elec. Devices, vol. ED-26, No. 4, Apr. 79.

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