Charged-particle optical systems and pattern transfer apparatus

Details Charged-particle optical systems and pattern transfer apparatus Charged-particle optical systems and pattern transfer apparatus

1998-01-27

2000-05-09

Anderson, Bruce C.

Radiant energy

Invisible radiant energy responsive electric signalling

With means to inspect passive solid objects

250396ML, 2504922, H01J 3714

Patent

active

060607114

ABSTRACT:
Charged-particle beam pattern transfer apparatus and charged-particle beam optical systems are disclosed. A representative charged-particle beam pattern transfer apparatus comprises a projection lens that images patterns from a mask onto a substrate. To reduce off-axis image aberrations, especially anisotropic coma and astigmatism, deflectors are provided that produce a magnetic field such that the effective optical axis of the lenses is along a straight line that is tilted with respect to the mask and the substrate. Focus correctors are provided that produce a magnetic field that corrects image focus. Mathematical descriptions of these magnetic fields are disclosed. With such magnetic fields, the charged-particle beam that irradiates a central region of a subfield on the mask propagates along a straight-line axis through the projection lens, reducing deflection aberration and improving image quality.

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Zhong-wei Chen et al., "The Optical Properties of 'Swinging Objective Lens' in a Combined Magnetic Lens and Deflection System With Superimposed Field," Optik 64, pp. 341-347 (1983).
H.C. Pfeiffer et al., "Advanced Deflection Concept for Large Area, High Resolution E-Beam Lithography," J. Vac. Sci. Technol. 19, pp. 1058-1063 (1981).

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