Charged-particle optical system

Details Charged-particle optical system Charged-particle optical system

2006-03-21

2006-03-21

Lee, John R. (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

With target means

C250S310000, C250S3960ML

Reexamination Certificate

active

07015481

ABSTRACT:
On a charged-particle optical system for achieving optimum aberration correction and obtaining a minimum probe diameter, the optical system focuses a beam of charged particles onto a surface of a specimen, and has four stages of multipole elements arranged along the optical axis of the beam, power supplies capable of supplying five or more independent octopole electric or magnetic potentials, and a control portion for correcting third-order aperture aberrations by adjusting the five or more independent octopole electric or magnetic potentials independently. The power supplies apply normal octopole electric or magnetic potentials to at least three of the four stages of multipole elements independently and apply skew octopole electric or magnetic potentials to at least two of the multipole elements independently.

REFERENCES:
patent: 6627890 (2003-09-01), Lanio
patent: 6770887 (2004-08-01), Krivanek et al.
Von H. Rose,Optik 33, Heft 1, 1-24 (1971).
Von H. Rose,Optik 34, Heft 3, 285-311 (1971).
M. Haider et al., “Design and test of an electric and magnetic dodecaple lens”,Optik 63, No. 1, 9-23 (1982).
J. Zach, “Design of a high-resolution low-voltage scanning electron microscope”,Optik 83, No. 1, 30-40 (1989).
Joachim Zach et al., “Aberration correction in a low voltage SEM by a multipole corrector”,Nucl. Instr. and Meth. in Phys. Res. A363, 316-325 (1995).

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