Charged-particle beam writer

Details Charged-particle beam writer Charged-particle beam writer

2006-02-21

2006-02-21

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

Reexamination Certificate

active

07002167

ABSTRACT:
A charged-particle beam writer which draws a pattern on a specimen with a charged-particle beam generated from a single particle generator by both of a VSB strategy and a scan-projection strategy, the charged-particle beam writer comprising a data creating unit configured to create pattern data representing a state where a first-type figure drawn by the VSB strategy and a second-type figure drawn by the scan-projection strategy are arranged on the specimen, a computing unit configured to calculate, on the basis of the pattern data, the amount of correction for correcting the drawing dimensions of the first-type figure on the specimen and the drawing dimensions of the second-type figure on the specimen, and a control unit configured to control the dose of beam at each position on the specimen on the basis of the calculated amount of correction.

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N. Shimomura, et al., “Optical Column of Themask-Scan EB Mask Writer Test Stand”, vol. 4066, pp. 605-612, SPIE, 2000.

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