Charged particle beam transfer apparatus

Details Charged particle beam transfer apparatus Charged particle beam transfer apparatus

1997-09-29

1999-07-27

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

059294574

ABSTRACT:
A pattern transfer apparatus in which a part or all of a plurality of small areas on a mask are sequentially irradiated with a charged particle beam to transfer an image of a pattern provided in each of the irradiated small areas onto a radiation-sensitive substrate, e.g., a wafer. A pattern distribution condition is evaluated for each small area, and an image-formation condition of the pattern image with respect to the radiation-sensitive substrate is adjusted for each small area on the basis of predetermined information including a result of the evaluation.

REFERENCES:
patent: 5304811 (1994-04-01), Yamada et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5396077 (1995-03-01), Sohda et al.

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