Charged particle beam system with optical microscope

Details Charged particle beam system with optical microscope Charged particle beam system with optical microscope

1996-12-19

1999-05-18

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504922, 2504911, H01J37/26

Patent

active

059052660

ABSTRACT:
A charged particle beam system such as a focused ion beam system includes a vacuum chamber; an optical microscope located so as to have a filed of view within a first region of the chamber; a laser aligned with the optical microscope so as to project a laser beam into the first region; a charged particle beam column located within the chamber and arranged so as to focus a charged particle beam into a second region of the chamber; and specimen support located in the chamber and moveable between a first position in the first region and a second position in the second region. The laser is used to mark a DUT with a registration mark which is visible in the images from the optical microscope and the charged particle beam. The position of the registration mark can be accurately determined in the optical image and the position of features which would otherwise be invisible in the charged particle beam image inferred.

REFERENCES:
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5214282 (1993-05-01), Yamaguchi et al.
patent: 5333495 (1994-08-01), Yamaguchi et al.

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