Charged-particle beam system

Details Charged-particle beam system Charged-particle beam system

2007-12-19

2010-10-26

Berman, Jack I (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML

Reexamination Certificate

active

07820978

ABSTRACT:
A charged-particle beam system has a demagnifying lens for reducing the dimensions of an electron beam produced from an electron beam source, an objective lens for focusing the demagnified beam onto the surface of a target, a first deflector located before the demagnifying lens, a second deflector placed such that the deflection field produced by it is totally or partially superimposed on the objective lens field, and a third deflector located in a stage following the second deflector. An image of the light source is created by the demagnifying lens. An image of the light source image is formed on the target by the objective lens.

REFERENCES:
patent: 5831270 (1998-11-01), Nakasuji
patent: 2007/0158563 (2007-07-01), Goto
patent: 59-83336 (1984-05-01), None
Teruo Hosokawa, “Systematic elimination of third order aberrtions in electron beam scanning system,” Optik, vol. 56, No. 1 (1980), pp. 21-30.

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