Charged-particle-beam projection-exposure method exhibiting aber

Details Charged-particle-beam projection-exposure method exhibiting aber Charged-particle-beam projection-exposure method exhibiting aber

1998-12-10

2000-02-22

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, G03F 900

Patent

active

060278412

ABSTRACT:
Charged-particle-beam transfer-exposure apparatus are disclosed exhibiting reduced hybrid distortion. A charged particle beam passes through a mask and through a projection-lens assembly to form an image of a selected mask region on a wafer. Signals corresponding to the functions d.sub.x1 (X.sub.w, Y.sub.w, Z, I, s), d.sub.y1 (X.sub.w, Y.sub.w, Z, I, s), d.sub.x2 (X.sub.w, Y.sub.w, Z, I, s), d.sub.y2 (X.sub.w, Y.sub.w, Z, I, s), . . . , are generated by a computer and routed to respective deflectors to minimize deflection aberrations, wherein X.sub.w, Y.sub.w are the coordinates of the deflected transfer region on the wafer, Z is the wafer height, I is the beam current passing through the pattern area in a mask region, and s is a variable pertaining to scattering of charged particles in the pattern. The signals routed to the various deflectors also take into account the function g(X.sub.w, Y.sub.w, Z, I, s) which corrects deflection distortion.

REFERENCES:
patent: 5635719 (1997-06-01), Petric
Koikari et al., "Numerical Calculation on Optical System for EB Projection," Microprocess '96, The 9.sup.th Int'l Microprocess Conf., Jul. 8-11, 1996.
Saitou et al., "A High-Speed, High-Precision Electron Beam Lithography System (Electron Optics)," J. Vac. Sci. Technol. 3:98-101 (1985).
Zhu et al., "Dynamic Corrections of Aberrations in Focusing and Deflection Systems with Shaped Beams," SPIE 2522:66-77 (1995).

Affiliated with

Also associated with

Rating

Charged-particle-beam projection-exposure method exhibiting aber does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged-particle-beam projection-exposure method exhibiting aber, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged-particle-beam projection-exposure method exhibiting aber will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-519047