Charged-particle-beam projection-exposure apparatus with integra

Details Charged-particle-beam projection-exposure apparatus with integra Charged-particle-beam projection-exposure apparatus with integra

1997-09-30

2000-09-26

Ballato, Josie

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

355 53, G03B 2758, G03B 2742

Patent

active

061247189

ABSTRACT:
Charged-particle-beam (CPB) projection-exposure apparatus are disclosed for inspecting a reticle and/or a substrate without having to remove the reticle and/or substrate from a vacuum chamber in which projection-exposure occurs. The CPB projection-exposure apparatus comprises a microscope for inspecting the reticle or substrate inside the vacuum chamber. For inspection, the reticle or mask is moved from a projection-exposure position to an inspection position within a field of view of the microscope without having to open the vacuum chamber.

REFERENCES:
patent: 4699515 (1987-10-01), Tanimoto et al.
patent: 4814829 (1989-03-01), Kosugi et al.
patent: 4834540 (1989-05-01), Totsuka et al.
patent: 5825470 (1998-10-01), Miyai et al.
Zapka et al., "Laser Cleaning of Wafer Surfaces and Lithography Masks," Microelectronic Engineering 13:547-550 (1991). ( No Month Available).

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