Charged-particle-beam projection-exposure apparatus and methods

Details Charged-particle-beam projection-exposure apparatus and methods Charged-particle-beam projection-exposure apparatus and methods

1999-10-14

2000-11-21

Adams, Russell

Photocopying

Projection printing and copying cameras

Step and repeat

2504922, 25049222, G03B 2742, A61N 500, G21K 510

Patent

active

061511013

ABSTRACT:
Charged-particle-beam (CPB) methods and apparatus are disclosed that achieve efficient correction of imaging distortions or astigmatisms (e.g., shape astigmatism) arising from differences in feature distributions within individual exposure units of a divided reticle defining a pattern for use in divided-pattern projection-exposure CPB microlithography. Before exposure of the reticle, data concerning the feature distribution inside each exposure unit of the reticle are evaluated so as to produce a respective "index" datum for the exposure units. Corresponding to each datum is a profile of values of imaging parameters. These data are stored as a look-up table in a memory of a controller. The table is queried when an exposure unit of the reticle comes up for exposure. The index of the respective exposure unit provides a key to the respective values of the imaging parameters to be applied as the exposure unit is being exposed. As conditions dictate, the data in the table can be overridden. Also, the data can be interpolated or extrapolated to reduce the data processing burden accompanying the exposure of each exposure unit.

REFERENCES:
patent: 5130547 (1992-07-01), Sakamoto et al.
patent: 5404019 (1995-04-01), Ohno et al.
patent: 6057907 (2000-05-01), Satoh et al.
patent: 6069684 (2000-05-01), Golladay et al.

Affiliated with

Also associated with

Rating

Charged-particle-beam projection-exposure apparatus and methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged-particle-beam projection-exposure apparatus and methods , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged-particle-beam projection-exposure apparatus and methods will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1263005