Charged particle beam photolithography machine, standard...

Details Charged particle beam photolithography machine, standard... Charged particle beam photolithography machine, standard...

2007-01-16

2007-01-16

Berman, Jack I. (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S252100, C250S492220

Reexamination Certificate

active

11090244

ABSTRACT:
A charged particle beam photolithography machine includes an electron gun, a deflector, a wafer stage, a standard substrate formed with a chip-shaped first mark group having a plurality of first marks and a chip-shaped second mark group having a plurality of second marks, a correction map having misalignment factors of the first marks based on positions of the second marks, and a deflection control unit for controlling an amount of deflection in the deflector. The charged particle is irradiated on a wafer while the deflection control unit makes reference to the correction map and corrects the amount of deflection as equivalent to the misalignment factors.

REFERENCES:
patent: 4442361 (1984-04-01), Zasio et al.
patent: 5280437 (1994-01-01), Corliss
patent: 6762421 (2004-07-01), Nakasugi
patent: 2002-110516 (2002-04-01), None

Affiliated with

Also associated with

Rating

Charged particle beam photolithography machine, standard... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam photolithography machine, standard..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam photolithography machine, standard... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3747413