Charged-particle-beam optical systems

Details Charged-particle-beam optical systems Charged-particle-beam optical systems

1998-04-29

1999-11-02

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250396R, H01J 3700

Patent

active

059775505

ABSTRACT:
Charged-particle-beam optical systems are disclosed for transferring patterns from a mask to a wafer using a charged-particle beam ("CPB"). In an embodiment, a mask-illumination lens system forms a demagnified image of an illumination aperture on a mask subfield. A first and a second projection lens receive the CPB from the crossover and form a demagnified image of the selected subfield on the wafer. One or more deflectors are provided to deflect the CPB to the selected mask subfield. A magnetic field satisfying conditions of a moving objective lens or a variable axis lens is provided by a deflector so that a principal ray from the illumination aperture to the mask subfield coincides with an effective optical axis produced by the deflector. The focal lengths of the mask-illumination lens system and the first projection lens satisfy conditions so that the CPB optical system is compact.

REFERENCES:
patent: 5770863 (1998-06-01), Nakasuzi
Waskiewicz et al., "Electron-Optical Design for the Scalpel Proof-of-Concept Tool," SPIE 2522:13-22 (1995).

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