Charged particle beam lithography method

Details Charged particle beam lithography method Charged particle beam lithography method

1989-09-15

1990-07-24

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250398, H01J 37302

Patent

active

049437305

ABSTRACT:
A charged particle beam lithography method wherein the workpiece material is mounted on a stage the position of which is detected by a laser interferometer. Patterns are expanded or reduced by a scaling factor by the steps of adjusting the gain of the deflection system controlling the charged particle beam and adjusting the size of movements of the stage in accordance with the scaling factor.

REFERENCES:
patent: 4063103 (1977-12-01), Sumi
patent: 4530064 (1985-07-01), Takigawa et al.
patent: 4818885 (1989-04-01), Davis et al.

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