Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-05-29
2000-09-19
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
H01J 37304
Patent
active
061216259
ABSTRACT:
In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.
REFERENCES:
patent: 5932884 (1999-08-01), Aizaki
Ito Hiroyuki
Nakayama Yoshinori
Okumura Masahide
Satoh Hidetoshi
Sohda Yasunari
Hitachi , Ltd.
Nguyen Kiet T.
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