Charged particle beam lithograph apparatus

Details Charged particle beam lithograph apparatus Charged particle beam lithograph apparatus

1997-03-20

1998-12-15

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

250396ML, 2504922, H01J 37145

Patent

active

058500839

ABSTRACT:
A charged particle beam lithograph apparatus of the present invention projects a charged particle beam onto a sample through a mask and lithographs a mask pattern on the sample through the movement of the charged particle beam. In order to focus the charged particle beam, the apparatus creates an electromagnetic field, from the magnetic lens, symmetric with respect to an optical axis of the charged particle beam. An aberration of the charged particle beam is created under the symmetric electromagnetic magnet. The aberration is compensated for under an electromagnetic field nonsymmetric with respect to the optical axis which is created by a deflection unit.

REFERENCES:
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patent: 4137459 (1979-01-01), Albrecht et al.
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patent: 5635719 (1997-06-01), Petric
patent: 5757010 (1998-05-01), Langner
Hajime Ohiwa, "Moving Objective Lens and the Fraunhofer Condition for Pre-deflection", OPTIK, vol. 53, No. 1, 1979, pp. 63-68.
Teruo Hosokawa, "Systematic Elimination of Third Order Aberrations in Electron Beam Scanning System", OPTIK, vol. 56, No. 1, 1980, pp. 21-30.

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