Charged particle beam extraction and formation apparatus

Electric lamp and discharge devices – Fluent material supply or flow directing means – Plasma

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C313S360100, C313S361100, C313S308000, C313S326000, C313S491000, C313S300000, C313S348000, C315S111310

Reexamination Certificate

active

07005782

ABSTRACT:
A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

REFERENCES:
patent: 3683463 (1972-08-01), Siefer et al.
patent: 3752511 (1973-08-01), Racy
patent: 3864797 (1975-02-01), Banks
patent: 3914969 (1975-10-01), Banks
patent: 4082052 (1978-04-01), Looks
patent: 4092040 (1978-05-01), Tatina
patent: 4139228 (1979-02-01), Varadi
patent: 4439684 (1984-03-01), Hemmerich et al.
patent: 4447773 (1984-05-01), Aston
patent: 4749912 (1988-06-01), Hara et al.
patent: 4825646 (1989-05-01), Challoner et al.
patent: 4870284 (1989-09-01), Hashimoto et al.
patent: 4873467 (1989-10-01), Kaufman et al.
patent: 4879518 (1989-11-01), Broadhurst
patent: 4882028 (1989-11-01), Chhabra
patent: 4883968 (1989-11-01), Hipple et al.
patent: 4917044 (1990-04-01), Yau et al.
patent: 5220126 (1993-06-01), Borgwarth et al.
patent: 5448883 (1995-09-01), Meserole, Jr. et al.
patent: 5527591 (1996-06-01), Crotzer et al.
patent: 5551904 (1996-09-01), Hedges et al.
patent: 5559391 (1996-09-01), Valentian
patent: 5689950 (1997-11-01), Smith
patent: 5718831 (1998-02-01), Zigliotto
Technology and applications of broad-beam ion sources used in sputtering. Part I. Ion source technology, H.R. Kaufman, J. Vac. Sci. Technol., 21(3), Sep./Oct. 1982, pp725-736.
Handbook of Ion Beam Processing Technology, J.J. Cuomo et al., Noyes Publications, pp8-20, 1989.
Broad-beam ion sources: Present status and future directions, H.R. Kaufman, J. Vac. Sci. Technol., A4, May/Jun. 1986, pp764-771.
Dished Accelerator Grids on a 30-cm Ion Thruster, V.K. Rawlin et al., J. Spacecraft, pp29-35, Jan. 1973.
Mercury Ion Thruster Technology, J.R. Beattle et al., NASA Lewis Research Center, Mar. 1989, pp63-84.
Development of Advanced Inert-Gas Ion Thrusters, R.L. Poeschel, NASA Lewis Research Center, Jun. 1983, pp64-74.
Developments in broad-beam, ion-source technology and applications, H.R. Kaufman, J. Vac. Sci. Technol., 21(3), Sep./Oct. 1982, pp764-767.
Operating Characteristics of a 15-cm-dia. Ion Engine for Small Planetary Spacecraft, J.R. Brophy et al., 23rd International Electric Propulsion Conference, Sep. 1993, pp1-9.
Ion Sources for Ion Machining Applications, H.R. Kaufman et al., AIAA Journal v.15 No. 6 Jun. 1977, pp843-847.
Primary Electric Propulsion Technology Study, R.L. Poeschel et al., NASA Lewis Research Center, Nov. 1979, pp127-178.
Thirty-Eight-Centimeter Ion Source, H.R. Kaufman et al., Nuclear Instruments and Methods in Physics Research, pp. 98-102, (Dec., 1989).
Feasibility Study of Large-Scale Rf-Ion Thrusters, H.W. Loeb et al., 41st Congress of the International Astronautical Federation, pp. 1-12 (Oct., 1990).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Charged particle beam extraction and formation apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam extraction and formation apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam extraction and formation apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3659217

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.