Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1982-03-04
1984-09-04
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250398, H01J 3700
Patent
active
044699506
ABSTRACT:
A charged particle beam exposure system for selectively irradiating the surface of a workpiece to be patterned. The beam has a cross-section at the surface of the workpiece comprising a projected line on variable length, of controlled width and one of two orthogonal orientations. An image of an L-shaped aperture is focussed on a shaping aperture with two adjacent orthogonal edges and is deflected relative to the shaping aperture to provide an intermediate line of desired length, width and orientation. The intermediate line is defined by the portion of the image of the L-shaped aperture which is superimposed on the shaping aperture. An image of the intermediate line is projected onto the workpiece to form the projected line which is scanned over the surface of the workpiece. Radial beam spreading is reduced and pattern line resolution is improved in the disclosed system.
REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 4112305 (1978-09-01), Goto et al.
patent: 4117340 (1978-09-01), Goto et al.
patent: 4145597 (1979-03-01), Yasuda
patent: 4151422 (1979-04-01), Goto et al.
patent: 4167676 (1979-09-01), Collier
patent: 4182958 (1980-01-01), Goto et al.
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4258265 (1981-03-01), Sumi
H. Pfeiffer, "Variable Spot Shaping for Electron Beam Lithography," J. Vac. Sci. Technol., vol. 15, No. 3, May/Jun. 1978, p. 887.
W. Knauer, "Boersch Effect in Electron-Optical Instruments," J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, p. 1676.
E. Goto et al., "Design of Variable Shaped Beam Systems," Proc. of the 8th Int. Conf. on Electron and Ion Beam Science and Technology, 1978, p. 135.
T. Groves et al., "Electron-Beam Broadening Effects Caused by Discreteness of Space Charge," J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, p. 1680.
M. Thomson et al., "Double-Aperture Method of Producing Variably Shaped Writing Spots for Electron Lithography," J. Vac. Sci. Technol., vol. 15, No. 3, May/Jun. 1978, p. 891.
Goto et al., "Design of a Variable-Aperture Projection and Scanning System for Electron Beam," J. Vac. Sci. Technol., vol. 15, No. 3, May/Jun. 1978, p. 883.
E. Cogswell et al., "Electron Lithography System with Variable-Shaped Electron Beam," Proc. of the 8th Int. Conf. on Electron and Ion Beam Science and Technology, 1978, p. 117.
H. Pfeiffer et al., "Advanced Beam Shaping Techniques for Electron Lithography," Proc. of the 8th Int. Conf. on Electron and Ion Beam Science and Technology, 1978, p. 149.
Petric Paul F.
Taylor Norman J.
Anderson Bruce C.
Cole Stanley Z.
McClellan William R.
Varian Associates Inc.
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