Charged particle beam exposure system and method

Details Charged particle beam exposure system and method Charged particle beam exposure system and method

1996-11-08

1999-11-02

Anderson, Bruce

Radiant energy

With charged particle beam deflection or focussing

With detector

250398, 25049222, H01J 37304

Patent

active

059775483

ABSTRACT:
A charged particle beam exposure method including steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

REFERENCES:
patent: 4511980 (1985-04-01), Watanabe
patent: 4641252 (1987-02-01), Tokita
patent: 4980567 (1990-12-01), Lischke
patent: 5041764 (1991-08-01), Midland et al.
patent: 5144142 (1992-09-01), Fueki et al.
patent: 5214289 (1993-05-01), Betsui et al.
patent: 5262341 (1993-11-01), Fueki et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5384463 (1995-01-01), Honjo et al.
patent: 5391886 (1995-02-01), Yamada et al.
patent: 5430304 (1995-07-01), Yasuda et al.
patent: 5444257 (1995-08-01), Satoh et al.
patent: 5448075 (1995-09-01), Fueki et al.
patent: 5557105 (1996-09-01), Honjo et al.

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