Charged particle beam exposure system and method

Details Charged particle beam exposure system and method Charged particle beam exposure system and method

1995-03-15

1996-06-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504922, H01J 37304

Patent

active

055280480

ABSTRACT:
A charged particle beam exposure method includes the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage having a second, higher access speed, reading the dot pattern data out from the second storage device, and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array, wherein the blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

REFERENCES:
patent: 4511980 (1985-04-01), Watanabe
patent: 4641252 (1987-02-01), Tokita
patent: 5262341 (1993-11-01), Fueki et al.
patent: 5448075 (1995-09-01), Fueki et al.

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