Charged particle beam exposure system

Details Charged particle beam exposure system Charged particle beam exposure system

2011-01-11

2011-01-11

Vanore, David A (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492200, C250S492300

Reexamination Certificate

active

07868307

ABSTRACT:
A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

REFERENCES:
patent: 3715580 (1973-02-01), Maekawa et al.
patent: 3952228 (1976-04-01), Reader et al.
patent: 4684848 (1987-08-01), Kaufman et al.
patent: 4996441 (1991-02-01), Lischke
patent: 5012105 (1991-04-01), Ando et al.
patent: 5363021 (1994-11-01), MacDonald
patent: 5616926 (1997-04-01), Shinada et al.
patent: 6566664 (2003-05-01), Muraki
patent: 6614035 (2003-09-01), Hartley
patent: 6710361 (2004-03-01), Pfeiffer et al.
patent: 6734428 (2004-05-01), Parker et al.
patent: 6771013 (2004-08-01), Magera et al.
patent: 6787780 (2004-09-01), Hamaguchi et al.
patent: 6825480 (2004-11-01), Watanabe et al.
patent: 6844550 (2005-01-01), Yin et al.
patent: 6870171 (2005-03-01), Hosoda et al.
patent: 6897458 (2005-05-01), Wieland et al.
patent: 6946665 (2005-09-01), Muraki et al.
patent: 6965153 (2005-11-01), Ono et al.
patent: 6989546 (2006-01-01), Loschner et al.
patent: 7064477 (2006-06-01), Magera et al.
patent: 7084414 (2006-08-01), Wieland et al.
patent: 2001/0032939 (2001-10-01), Gerlach
patent: 2003/0001095 (2003-01-01), Lo
patent: 2003/0178583 (2003-09-01), Kampherbeek
patent: 2003/0209676 (2003-11-01), Loschner et al.
patent: 2004/0188636 (2004-09-01), Hosoda
patent: WO 01/48787 (2001-07-01), None
patent: WO 2004/081910 (2004-09-01), None

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