Charged particle beam exposure system

Details Charged particle beam exposure system Charged particle beam exposure system

1998-02-12

1999-07-06

Anderson, Bruce

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 37302

Patent

active

059200774

ABSTRACT:
A charged particle beam exposure method including the steps of creating dot pattern data indicative of a pattern to be exposed, storing the dot indicative of a pattern to be exposed, storing the dot pattern data in a first storage device having a first access speed, transferring the dot pattern data from the first storage device to a second storage device having a second, higher access speed, reading the dot pattern data out from the second storage device; and producing a plurality of charged particle beams in response to the dot pattern data read out from the second storage device by means of a blanking aperture array. The blanking aperture array includes a plurality of apertures each causing turning-on and turning-off of a changed particle beam pertinent to the aperture in response to the dot pattern data.

REFERENCES:
patent: 4433384 (1984-02-01), Berrian et al.
patent: 4511980 (1985-04-01), Watanabe
patent: 4541115 (1985-09-01), Werth
patent: 4641252 (1987-02-01), Tokita
patent: 4661709 (1987-04-01), Walker et al.
patent: 5041764 (1991-08-01), Midland et al.
patent: 5262341 (1993-11-01), Fueki et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5430304 (1995-07-01), Yasuda et al.
patent: 5444257 (1995-08-01), Satoh et al.
patent: 5448075 (1995-09-01), Fueki et al.
patent: 5500930 (1996-03-01), Fueki

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