Charged-particle-beam exposure method with temperature-compensat

Details Charged-particle-beam exposure method with temperature-compensat Charged-particle-beam exposure method with temperature-compensat

1998-03-18

1999-06-15

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430296, G03F 900, G03C 500

Patent

active

059120967

ABSTRACT:
Apparatus and methods are disclosed for increasing the throughput and accuracy of a charged-particle-beam (CPB) exposure apparatus. The apparatus comprises a CPB optical system for exposing a pattern onto a sensitive substrate in a vacuum chamber. During exposure, the substrate is placed on a movable stage. If the substrate temperature is not equal to the exposure-environment temperature, calibrated data on a temperature-correction factor of the substrate is obtained and used to convert XY coordinates for an exposure-environment temperature exposure of the substrate into corrected XY coordinates for exposure at the actual substrate temperature. Exposure of the substrate is positionally accurate even if, after exposure, the substrate undergoes expansion or contraction as the substrate equilibrates with the exposure-environment temperature.

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