Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1998-04-07
2000-07-11
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430296, G03F 900
Patent
active
060870524
ABSTRACT:
The basis of the present invention is a charged particle beam exposure method comprising the steps of: (a) generating a plurality of areas within the sub-fields; (b) determining the pattern density within each of the areas, and correcting the pattern density in accordance with the pattern density of areas surrounding the area and the distance between areas; (c) generating a supplementary exposure pattern in the area when the corrected pattern density for the area is lower than a prescribed reference exposure density; and (d) exposing the material in accordance with exposure data comprising the supplementary exposure pattern data appended to the pattern data. A first invention comprises a step for further generating a supplementary exposure pattern in areas lying between pattern existing regions where the patterns are located, and having a pattern density higher than the reference exposure density, when the distance between the pattern existing regions is greater than a prescribed reference distance.
REFERENCES:
patent: 5858591 (1999-01-01), Lin et al.
Hoshino Hiromi
Manabe Yasuo
Fujitsu Limited
Young Christopher G.
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