Charged particle beam exposure method and mask employed therefor

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430296, 430311, G03F 900

Patent

active

057006040

ABSTRACT:
A charged particle beam exposure method capable of suppressing the degradation of dimensional accuracy of exposed pattern elements due to the proximity effect and Coulomb effect defocusing. The charged particle beam exposure method is a method in which a charged particle beam is irradiated to a mask to transfer an image of a pattern formed on the mask onto a radiation-sensitive substrate. The method includes dividing one exposed pattern element which is to be formed on the radiation-sensitive substrate into a plurality of regions including a region lying at a marginal portion of the exposed pattern element and at least one other region lying inside the marginal portion, and forming patterns respectively corresponding to the regions on the mask, and further adjusting, when the patterns are to be transferred onto the radiation-sensitive substrate, the transfer positions of images of the patterns corresponding to the regions so that the divided regions are combined together to form the exposed pattern element on the radiation-sensitive substrate.

REFERENCES:
patent: 5079112 (1992-01-01), Berger et al.
patent: 5082762 (1992-01-01), Takahashi
patent: 5130213 (1992-07-01), Berger et al.
patent: 5432714 (1995-07-01), Chung et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Charged particle beam exposure method and mask employed therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam exposure method and mask employed therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam exposure method and mask employed therefor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1801448

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.