Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-07-15
1998-09-15
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25049222, 250398, H01J 3700
Patent
active
058083138
ABSTRACT:
The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged particle beam having a predetermined shape is irradiated to a sample to have the surface of the sample be exposed, comprises the steps of: storing a record of a first quantity of reflected electrons or a first sample current, which is detected in accordance with the charged particle beam irradiatd to the sample when a first exposure pattern is formed in a first area of the sample; and comparing a second quantity of reflected electrons or a second sample current, which is detected in accordance with the charged particle beam irradiated to the sample when the first exposure pattern is formed in a second area of the sample, with the first quantity of the reflected electrons or the first sample current which is stored when the first area is exposed, and generating a matched or unmatched signal therefor.
REFERENCES:
patent: 5391886 (1995-02-01), Yamada et al.
Saito Atsushi
Yabara Hidefumi
Yamada Akio
Yasuda Hiroshi
Fujitsu Limited
Nguyen Kiet T.
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