Charged particle beam exposure method and apparatus

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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2504922, 335210, 335213, H01J 332

Patent

active

053828003

ABSTRACT:
A charged particle beam exposure method for deflecting a charged particle beam in a deflection system which includes electromagnetic deflection coils, includes the steps of (a) controlling the deflection system based on deflection data, and (b) generating heat at least a vicinity of the electromagnetic deflection coils so as to compensate for a change in heat generated from the electromagnetic deflection coils.

REFERENCES:
patent: 3707628 (1972-12-01), Bassett et al.
patent: 4748429 (1988-05-01), Aubert
patent: 4817706 (1989-04-01), Miyama et al.
patent: 5101638 (1992-04-01), White
patent: 5136166 (1992-08-01), Young

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