Charged particle beam exposure including a heat blocking partiti

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

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Details

2504922, 2504923, 335213, H01J 332

Patent

active

053389395

ABSTRACT:
A charged particle beam exposure method deflects a charged particle beam in a deflection system which includes electromagnetic deflection coils and an electromagnetic lens. The charged particle beam exposure method includes controlling the deflection system based on deflection data, and blocking heat radiation from at least the electromagnetic deflection coils by a partition so as to prevent the heat radiation from reaching the electromagnetic lens and to prevent heat conduction to the electromagnetic lens by the partition.

REFERENCES:
patent: 4806767 (1989-02-01), Kubozoe et al.
patent: 5008549 (1991-04-01), Crewe
patent: 5041731 (1991-08-01), Oae et al.
patent: 5264706 (1993-11-01), Oae et al.

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