Charged-particle beam exposure device incorporating beam splitti

Details Charged-particle beam exposure device incorporating beam splitti Charged-particle beam exposure device incorporating beam splitti

1985-06-03

1986-02-04

Smith, Alfred E.

Radiant energy

With charged particle beam deflection or focussing

With target means

250396R, 2504922, H01J 316, H01J 2960, H01J 37302, H01J 37317

Patent

active

045688338

ABSTRACT:
For forming an array or series of elementary beams of charged particles, a beam exposure device includes a mirror system having a matrix of sub-mirrors. Using such a composite mirror, a multiple beam image is formed in a location which deviates from the position of the cross-over of principal rays of the elementary beams. Consequently, the elementary beams, which may alternatively be ion beams, can be separated modulated and controlled. For suitable imaging, such as the writing of patterns for a micro-electronic circuit element, the images and the cross-over of the principal rays of the elementary beams are combined. For this purpose, use is made of a second mirror whose sub-mirrors have an optical effect which opposes that of the first mirror.

REFERENCES:
patent: 4418283 (1983-11-01), Trotel

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