Charged particle beam exposure device for improving the heating

Details Charged particle beam exposure device for improving the heating Charged particle beam exposure device for improving the heating

1992-01-06

1993-01-05

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

051773651

ABSTRACT:
A charged particle beam exposure device includes a charged particle optical column for selecting one or more minute block patterns from a plurality of block patterns formed on a block mask, and for irradiating a charged particle beam having a specific sectional shape determined by the selected block pattern onto a surface of a substrate to be processed. The charged particle beam exposure device comprises a beam control unit, provided between a beam generation unit and the block mask, for uniformly irradiating the charged particle beam onto the block mask during a waiting period. Therefore, a thermal nonuniformity of a block mask, caused by an electron beam, can be avoided, and thus a high density integrated circuit pattern having a high accuracy can be uniformly formed with a high throughput.

REFERENCES:
patent: 4213053 (1980-07-01), Pfeiffer
patent: 4687940 (1987-08-01), Ward et al.

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