Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1997-11-18
2000-06-06
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
2504922, H01J 37304
Patent
active
060721855
ABSTRACT:
A device exposing a wafer to charged-particle beams in an exposure process generates a plurality of micro beams and controls deflection of each of the micro beams, relative to whether or not the micro beams reach the wafer, in accordance with control data. A data processing unit inserts data-position-adjustment data into the control data for each exposure. A first data-storage unit stores the control data, inserted with the data-position-adjustment data, and outputs the control data at a time of the exposure process. Storage positions of the control data in the first data-storage unit are adjusted by the data-position-adjustment data so that the control data can be continuously read from the first data-storage unit for maintaining a continuous exposure process.
REFERENCES:
patent: 4433384 (1984-02-01), Berrian et al.
patent: 4837447 (1989-06-01), Pierce et al.
patent: 5430304 (1995-07-01), Yasuda et al.
patent: 5444257 (1995-08-01), Satoh et al.
patent: 5448075 (1995-09-01), Fueki et al.
patent: 5528048 (1996-06-01), Oae et al.
patent: 5614725 (1997-03-01), Oae et al.
Arai Soichiro
Miyazawa Kenichi
Yabara Hidefumi
Yasuda Hiroshi
Anderson Bruce C.
Fujitsu Limited
LandOfFree
Charged-particle-beam exposure device and method capable of high does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Charged-particle-beam exposure device and method capable of high, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged-particle-beam exposure device and method capable of high will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2215295