Charged particle beam exposure apparatus, device...

Details Charged particle beam exposure apparatus, device... Charged particle beam exposure apparatus, device...

2005-06-07

2005-06-07

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S3960ML

Reexamination Certificate

active

06903353

ABSTRACT:
A high-precision multi-charged-particle-beam exposure apparatus has a charged particle source (ES) that emits a charged particle beam. An aperture array (AA) having plural apertures divides the charged particle beam from the charged particle source (ES) into plural charged particle beams and a lens array (LA) having plural electron lens forms plural intermediate images of the charged particle source (ES) on substantially one plane with the plural charged particle beams from the aperture array (AA). A blanker array (BA) located on the plane where the plurality of intermediate images are to be formed has plural blankers, and a reduction electron optical system that reduces and projects the images of the charged particle source (ES) onto a substrate.

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Korean Office Action dated Mar. 9, 2004, issued in a corresponding Korean patent application, No. 10-2002-0021943.

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