Charged particle beam exposure apparatus, charged particle...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492200, C250S492300, C250S492230, C250S3960ML

Reexamination Certificate

active

11159356

ABSTRACT:
A charged particle beam exposure apparatus for writing a desired pattern on a substrate using a charged particle beam. The apparatus includes a blanking unit, having a deflector capable of deflecting the charged particle beam in at least two directions, configured to control beam passage to the substrate by deflecting the charged particle beam, and a setting unit configured to set a deflection direction of the charged particle beam by the deflector.

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“Electron and Ion Beam Handbook,” Japan Society for Promotion of Science, the 132 Meeting Edition, The Nikkan Kogyo Shimbun, Ltd., 1998, pp. 519-523, with English translation.

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