Charged-particle-beam exposure apparatus and methods with substr

Details Charged-particle-beam exposure apparatus and methods with substr Charged-particle-beam exposure apparatus and methods with substr

1998-02-23

1999-06-22

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504431, H01L 2100

Patent

active

059144939

ABSTRACT:
Apparatus and methods are disclosed for increasing the throughput of a charged-particle-beam exposure apparatus. The apparatus comprises an exposure-processing chamber in which exposure of individual sensitive substrates is performed using a charged-particle beam under preset vacuum and temperature conditions. A load-lock chamber, connected to the exposure-processing chamber by a gate valve, is used to bring the sensitive substrate from atmospheric conditions to a vacuum condition in preparation for transport into the exposure-processing chamber. Means are provided for adjusting the temperature of the sensitive substrates so that, upon entry of the sensitive substrate into the exposure-processing chamber, the temperature of the sensitive substrate matches an interior temperature of the exposure-processing chamber.

REFERENCES:
patent: 4911103 (1990-03-01), Davis et al.

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