Charged particle beam exposure apparatus and method

Details Charged particle beam exposure apparatus and method Charged particle beam exposure apparatus and method

2006-02-28

2006-02-28

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100

Reexamination Certificate

active

07005658

ABSTRACT:
A multi-charged-particle beam drawing apparatus and method that can correct a change in positional relationship, caused by the Coulomb effect, among charged particle beams are provided. The focal lengths of two electron lenses (21, 22) that form a condenser lens (2) are adjusted individually to change a relative positional relationship between the front focal position of the condenser lens (2) and an electron source (ES). Electron beams becoming incident on an aperture array (AA) can diverge, or be focused or collimated. Therefore, positions where intermediate images (img1-img3) are to be formed can be changed, and the change in positional relationship, caused by the Coulomb effect, among the charged particle beams can be corrected.

REFERENCES:
patent: 5864142 (1999-01-01), Muraki et al.
patent: 5905267 (1999-05-01), Muraki
patent: 5929454 (1999-07-01), Muraki et al.
patent: 5939725 (1999-08-01), Muraki
patent: 5981954 (1999-11-01), Muraki
patent: 6054713 (2000-04-01), Miyake et al.
patent: 6104035 (2000-08-01), Muraki
patent: 6107636 (2000-08-01), Muraki
patent: 6124599 (2000-09-01), Muraki
patent: 6137113 (2000-10-01), Muraki
patent: 6274877 (2001-08-01), Muraki
patent: 6392243 (2002-05-01), Muraki
patent: 6566664 (2003-05-01), Muraki
patent: 10308340 (1998-11-01), None
patent: 10308341 (1998-11-01), None

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