Charged particle beam exposure apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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H01J 37302

Patent

active

054245508

ABSTRACT:
A charged particle beam exposure apparatus includes an irradiator for irradiating a sample with a charged particle beam, an analog controller for analog controlling the charged particle beam, a digital controller for digital controlling the analog controller, and a digital transmission path connecting the analog controller to the digital controller. The analog controller is disposed inside a room, and the digital controller is disposed outside the room.

REFERENCES:
patent: 4261762 (1981-04-01), King
patent: 4985634 (1991-01-01), Stengl et al.
patent: 5281827 (1994-01-01), Kawano et al.
T. H. P. Chang et al., "Electron-beam lithography draws a finer line", Electronics, vol. 50, No. 10, May 12, 1977, pp. 89-96.

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