Charged particle beam drawing equipment, method of adjusting...

Details Charged particle beam drawing equipment, method of adjusting... Charged particle beam drawing equipment, method of adjusting...

2007-07-10

2007-07-10

Wells, Nikita (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S492300, C250S3960ML

Reexamination Certificate

active

11172996

ABSTRACT:
A charged particle beam drawing equipment includes charged particle beam source, first and second shaping aperture masks with first and second opening portions for rotation adjustment, detection section to detect charged particle beam intensity distribution in a plane parallel to the second mask, the beam being emitted from the source and passing through the opening portions, rotation angle control section to control relative rotation angle between the masks, acquisition section to acquire relative rotation angle between the masks such that deviation in relative rotation angle between the masks falls within a predetermined range based on detection results obtained by changing the relative rotation angle between the masks plural times by the control section and by detecting the beam by the detection section for each rotation angle, and instruction section to instruct the rotation angle control section such that the relative rotation angle between the masks be the acquired rotation angle.

REFERENCES:
patent: 6137111 (2000-10-01), Yamada et al.
patent: 7095035 (2006-08-01), Nishimura
patent: 09-259804 (1997-10-01), None
patent: 3102632 (2000-08-01), None

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