Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-05-25
2009-10-27
Vanore, David A. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S310000, C345S443000
Reexamination Certificate
active
07608844
ABSTRACT:
In the present invention, vector data developing unit, ends separating unit, overlap removing unit and bitmapped data generating unit are sequentially connected in order to make pipeline processing. In addition, data of each raster is orderly arranged as a unit so that each processor can process data of each raster at a time. Each processor can make the pipeline processing to fast generate data. In addition, small-scale circuits can be used to realize the system because each raster can be processed as a unit of processing. Moreover, since data is orderly arranged before being processed, multi-valued bitmapped data can be generated in the order of drawing. Therefore, the drawing operation and data generating operation can be performed in parallel without use of any large-scale storage device.
REFERENCES:
patent: 4820928 (1989-04-01), Ooyama et al.
patent: 4837447 (1989-06-01), Pierce et al.
patent: 4882683 (1989-11-01), Rupp et al.
patent: 5533170 (1996-07-01), Teitzel et al.
patent: 5600734 (1997-02-01), Okubo et al.
patent: 5689255 (1997-11-01), Frazier et al.
patent: 5812412 (1998-09-01), Moriizumi et al.
patent: 6717097 (2004-04-01), Sandstrom et al.
patent: 2004/0119029 (2004-06-01), Nagata et al.
patent: 2004/0143356 (2004-07-01), Yoda et al.
patent: 60-198723 (1985-10-01), None
patent: 03-189874 (1991-08-01), None
patent: 04-286314 (1992-10-01), None
patent: 8-505003 (1996-05-01), None
patent: 2004-63870 (2004-02-01), None
patent: 2004-200351 (2004-07-01), None
patent: WO 94/10633 (1994-05-01), None
Ando Kimiaki
Inoue Yuji
Yoda Haruo
Yui Yoshikiyo
Antonelli, Terry Stout & Kraus, LLP.
Canon Inc.
Hitachi High-Technologies Corporation
Johnston Phillip A.
Vanore David A.
LandOfFree
Charged particle beam drawing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Charged particle beam drawing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam drawing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4141535