Charged particle beam application apparatus

Radiant energy – Means to align or position an object relative to a source or...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S306000, C250S307000, C250S309000, C250S310000, C250S311000

Reexamination Certificate

active

07009192

ABSTRACT:
The present invention enables the same target to be precisely machined and observed in a short time when a focal distance of a charged particle beam is changed or if the focal distances of charged particle beams are not equal on a sample. The present invention provides a charged particle beam application apparatus having a stage device used to move a sample in at least three axial directions, a charged particle beam optical system having an optical axis inclined from a surface of the sample to irradiate the sample with a charged particle beam, and a display device that displays an image formed by the charged particle beam optical system, the apparatus including a correction table indicating a relationship between both focal distance and optical conditions for said charged particle beam optical system and a position of the sample, and an arithmetic section that calculates the position of the sample, the arithmetic section calculating the amount of correction for the position of the sample so that when the focal distance of the charged particle beam changes, a position of a target on the sample is placed in the center of a visual field of a screen of the display device.

REFERENCES:
patent: 4694170 (1987-09-01), Slodzian et al.
patent: 5270552 (1993-12-01), Ohnishi et al.
patent: 5512747 (1996-04-01), Maeda
patent: 5677530 (1997-10-01), Sato et al.
patent: 6534766 (2003-03-01), Abe et al.
patent: 6538249 (2003-03-01), Takane et al.
patent: 6576902 (2003-06-01), Kuwahara
patent: 6642675 (2003-11-01), Ogasawara
patent: 6653633 (2003-11-01), Takane et al.
patent: 6753518 (2004-06-01), Watanabe et al.
patent: 6777697 (2004-08-01), Yui et al.
patent: 2001/0025925 (2001-10-01), Abe et al.
patent: 2002/0008200 (2002-01-01), Kuwahara
patent: 2002/0109090 (2002-08-01), Nakasuji et al.
patent: 2005/0045821 (2005-03-01), Noji et al.
patent: 11-213935 (1999-08-01), None
patent: 2000-251823 (2000-09-01), None
D Heddle, “Electrostatic Lens Systems”, <http://bookmarkphysics.iop.org/bookpge.htm?book=481h>.
Portland State University—Electron Optics Course—Summer 2001 session, PH 410, PH 510, <http://physics.pdx.edu/faculty—files/re/ElectronOptics/>.
SIMION 3D™ 7.0 Ion and Electron Optics Software, <http://www.sisweb.com/simion.htm>.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Charged particle beam application apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Charged particle beam application apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam application apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3609580

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.