Charged-particle beam apparatus equipped with aberration...

Radiant energy – With charged particle beam deflection or focussing – Magnetic lens

Reexamination Certificate

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C250S310000, C250S311000, C250S3960ML

Reexamination Certificate

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06924488

ABSTRACT:
A charged-particle beam instrument with an aberration corrector which comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central quadrupole elements of the four stages of electrostatic quadrupole elements on this electric potential distribution, and four stages of electrostatic octopole elements for superimposing an electric octopole potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements.

REFERENCES:
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patent: 6191423 (2001-02-01), Krijn et al.
patent: 6723997 (2004-04-01), Matsuya et al.
patent: 6770887 (2004-08-01), Krivanek et al.
patent: 6852983 (2005-02-01), Matsuya et al.
Von H. Rose,OPTIK 33, Heft 1, 197 pp. 1-24.
Von H. Rose,OPTIK 34, Heft 3, 1971, pp. 285-311.
E. Munro et al., “High-resolution, low-energy beams by means of mirror optics”,J. Vac. Sci. Technol. B 6 (6), Nov./Dec. 1988, pp. 1971-1976.
J. Zach, “Design of a high-resolution low-voltage scanning electron microscope”,OPTIK83, No. 1 (1989), pp. 30-40.
H. Rose, “Inhomogeneous Wien filter as a corrector compensating for the chromatic and spherical aberration of low-voltage electron microscopes”,OPTIK84, No. 3 (1990), pp. 91-107.
H. Rose, “Outline of a spherically corrected semiaplanatic medium-voltage transmission electron microscope”,OPTIK 85, No. 1 (1990), pp. 19-24.
Joachim Zach et al., “Aberration correction in a low voltage SEM by a multipole corrector”.Nucl. Instr. and Meth. in Phys. Res. A 363(1995), pp. 316-325.

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